PWM32

Imaging & Analysis Facility Use The Headway PWM32 spinner system is able to spin substrates up to 8 inches in diameter at speeds to 10,000 RPM. The easy to program control unit allows for up to 9 different spin steps in a recipe, each with a different spin speed, duration, and acceleration rate. A variety of different sized vacuum chucks can accommodate substrates from ~1mm to 200 mm in diameter. These tools are used in the application of photolithography and electron-beam lithography resists. Laboratory for Integrated Science and Engineering © 2025 Harvard CNS. All rights reserved. Center for Nanoscale Systems *