Rapid Thermal Annealing Furnace MTI 1200X-4-RTP

Maximum Heating rate: 50 o C/second (5 o C/second above 1000 oC) Sample size: 3” wafers or smaller or wafer fragments. Operates at room pressure.   If there is sufficient demand, it can be modified to work under a vacuum. Computer based temperature controller with spreadsheet compatible temperature recording.