ToF-SIMS V

ToF-SIMS V (ION-TOF GmbH.). The instrument is configured with multiple ion sources, including gas cluster ion technology for both profiling and spectrometry. The tool’s load-lock is interfaced to an Argon glovebox, with <1ppm oxygen and moisture levels. The system is also coupled to a dedicated low energy ion scattering spectrometer (visible in the background of the image above). Key Functionalities •Surface-specific high mass resolution spectrometry •High spatial resolution secondary ion imaging •High depth resolution secondary ion depth profiling •High dimensionality raw datasets allowing for retrospective data analysis Key Configuration Parameters •Highly-configured, with multiple ion sources including both liquid metal (Bi) and gas-cluster primary ion sources, as well as electron impact (rare gas, O2) and Caesium ion sources for profiling •Extended dynamic range analyzer •Sample cooling and heating (123 K – 873 K) •Sample transfer device (for transfer of samples under controlled environment between remote infrastructure and characterization instrument) •Integrated high-purity Argon glovebox (for transfer of air/moisture sensitive samples)