Image of Mask Aligner 4" | Kloé SA
Microfabrication and Nanofabrication

Mask Aligner 4" | Kloé SA

By Kloé SA

Washington University in St. Louis
0.0(0 reviews)

An easy to use UV-LED mask aligner that can perform photolithography on substrates  up to 4" diameter and with resolution as small as 2 microns. Front-side alignment can now be performed with joypad controls in a matter of minutes. It can be useful in many research applications not limiting it to microelectronics, microfluidics, optics & photonics.

Min. Booking: 1 hours
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