E-beam Evaporator | AJA International

The AJA International e-beam instrument can deposit materials for applications where high purity film and/or directionality of film growth is important. The deposition is done at very high vacuum ~1e-9 torr. Currently, the materials that can be deposited are: Al, AlO2, Nb, Ti. Oxygen gas is available to oxidize films in a controllable manner. Other materials are not possible due to conflicts with ongoing research and limitations in breaking the high vacuum condition. Deposition growth rate can range from 0.1 Angstrom/s to more than 4 Angstrom/s. If you need to deposit other materials, please contact IMSE staff.