Direct Write E-Beam Lithography System

Raith Electron Beam Lithography/Imaging 150Two. Training Requirements: 4 to 6 hours. Daily Entry Fee is required. Please create a 'Daily Entry Fee' reservation in addition to Raith tool reservation. The Raith 150two is an electron beam write system that can image to less than 10 nanometers. Main Applications: Nano-lithography, Imaging. Up to 30kV. SE and BSE detectors.