Raith EBPG5150 100-kV e-Beam Lithography System

The Raith EBPG5150 Electron Beam Lithography System is an ultra-high performance e-beam writer for nanometer-scaled device fabrication. Some of the instrument features are: Our system includes an automatic aperture changer upgrade, with motorized and software automated control of system final apertures. It can save and recall multiple column alignments and lens settings. This is particularly useful for setup and execution of unattended exposure tasks. In addition, the MRL purchased the GenISys BEAMER full advanced data preparation software with Monte Carlo simulation and proximity correction packages.