thin film_deposition
Atomic Layer Deposition
By FIJI - ALD System (2025)
University of Massachusetts Lowell
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Daily user entrance fee required. Please book in increments of 30min. ALD with Loadlock capable of Plasma or Thermal ALD. Substrate size: Up to 200mm. Substrate Temperature: up to 500C. Precursors Available: Al, Hf, Pt, Si, Nb, Ti others on request. Training is required before use.
Min. Booking: 1 hours
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