thin film_deposition
PECVD Dielectric - aSi, SiN, SiO2
By Generic - PECVD System (2025)
University of Massachusetts Lowell
0.0(0 reviews)
PECVD system for dielectric deposition. Substrate size: Up to 200mm, Temperature: up to 400°C.
Min. Booking: 1 hours
Download App to Book
Enterprise or contract research?