
plasma etching
ICP380 Metal etch
By Oxford Instruments - PlasmaLab 100 (2025)
University of Massachusetts Lowell
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System specification: RIE with 380mm ICP source. 3", 4", 6" and 8" clamps available. Please note what clamp size you will need at booking. Substrate Temperature: -150C to 400C. Chiller Mode: -10 to 80C, Cryo Mode: -10C to -150C, Heat Mode: 80C to 400C. Please note what mode you will need at booking. Available gases: SF6, C4F8, CF4, CHF3, Ar, He, O2, N2, CH4, H2, Cl2, Bcl3. Training is required before use.
Min. Booking: 1 hours
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